Non-plasma high-speed anisotropic diamond etching with nickel in 1000°C water vapor

(Kanazawa University) Development of next-generation power devices is needed for energy saving in a low carbon society. Diamond is a potentially important power device material due to its excellent physical and electronic properties. Here we have developed a non-plasma high-speed anisotropic etching process using a thermochemical reaction between nickel and diamond in high-temperature water vapor. This technology is expected to contribute to fabrication of diamond devices of excellent performance with highly reduced transmission loss and high-voltage endurance.